Lab equipment 3D Models

Find the best Lab equipment 3D Models, free download in STL, FBX, GLB, OBJ, 3MF, USDZ for 3D modeling and creation in Blender, 3D printing, game developing, animation, eCommerce, AR/VR and etc. Generated by Tripo AI 3D Generator.

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1. Overall Tool Structure (Outer to Inner)

The etching system is a closed vacuum-based processing tool mounted on a rigid frame, typically connected to a sub-fab below for pumps and gas handling.

Main internal sections:

Load lock chamber

Transfer chamber (robot)

Process (etch) chamber

Plasma generation system

Gas delivery & exhaust system

Wafer chuck (electrostatic chuck)

RF power & control modules

2. Load Lock Chamber (Wafer Entry)

Purpose: Isolate cleanroom air from vacuum environment.

3D elements to show:

FOUP port at the front

Load lock door

Vacuum pump connection

Pressure gauges

Working:

Wafer enters from FOUP

Load lock door closes

Chamber is pumped down from atmospheric pressure to vacuum

Once pressure matches process chamber, wafer transfers inside

3. Transfer Chamber & Robot Arm

Purpose: Move wafers without human contact.

3D elements:

Central vacuum chamber

Multi-axis robotic arm

Wafer end-effector (blade)

Gate valves to process chambers

Working:

Robot arm picks wafer fro

Anonymous1765970573

3D DESCRIPTION: PHOTOLITHOGRAPHY TOOL – SEMICONDUCTOR FAB

This 3D model represents a state-of-the-art photolithography tool installed inside an ISO Class 1–2 semiconductor cleanroom, designed for advanced wafer patterning at nanometer scales. The tool is shown in a fully assembled operational configuration, highlighting both its external structure and internal functional modules.

Overall Structure and Placement

The photolithography system is positioned on a vibration-isolated concrete pedestal above a raised cleanroom floor, ensuring nanometer-level stability. The tool footprint is rectangular and elongated, with clear separation between wafer handling, optical exposure, and control systems. Overhead, ULPA-filtered laminar airflow flows vertically downward to maintain ultra-low particle concentration at wafer level.

Front-End Wafer Handling Section

At the front of the tool, the FOUP (Front Opening Unified Pod) load ports are visible. These load ports interface with the fab’s AMHS (Automated Material Hand

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Шлифовально-полировальный станок Buehler EcoMet 30 Semi-Automatic Twin

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I have a diagram of water energy system that goes through heat exchangers to warm water and household tap/shower water. This system will be used on a website. I want to create a more refined version of this using glass for the pipes and allow for me to add programatic metrics. So no values should be shown.

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📐 模型总成技术规格
名称：两级协同除臭演示机
尺寸：L1500mm × W600mm × H1800mm（铝型材框架，正面亚克力板，带万向轮）
分区：左化学洗涤、中智能控制、右生物过滤。
整体用透明高强度塑料包围做成一体机，一体机上方顶盖遍布风机。
🔧 第一部分：化学洗涤舱（左侧）
蓝色碱液系统：透明亚克力储罐（Ø200mm×H300mm，内置蓝色LED），配迷你潜水泵。
喷淋塔：透明亚克力方柱（150mm×150mm×500mm），内填白色多面空心球，顶部装喷雾喷嘴。
进气模拟：小型气泵连接超声波雾化器（产生白雾）和醋酸挥发瓶（模拟酸味）。
显示：侧面LED面板，可手动调节显示pH从6.0升至7.5。
🧫 第二部分：生物过滤舱（右侧）
生物滤柱：透明亚克力圆柱（Ø250mm×H600mm），填充黄色PPC球，部分球体表面粘附绿色亲水海绵仿生膜。
营养液系统：绿色LED照明储罐，通过蠕动泵和环形滴滤管向滤柱缓慢滴加绿色液体。
气路连接：透明波纹管将洗涤舱出口气体导入滤柱底部。
显示：侧面LED面板，模拟NH₃浓度从50ppm降至5ppm。
🧠 第三部分：智能控制中心（中部）
面板布局：上部为7英寸触摸屏，中部设带灯按钮（启动/照明/停止），下部为指示灯和蜂鸣器。
控制逻辑：采用Arduino或小型PLC编程，实现一键顺序启动：
点亮储罐LED，启动化学舱泵与气泵（模拟臭气）。
延迟后启动生物舱蠕动泵。
触摸屏动态显示pH、硫化氢、NH₃、VOC等数值及处理效率（>90%）。
灯光效果：内置LED灯带编程流水点亮，引导视觉流程。
整体一定要用一体机形式展示出来，逻辑合理

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